SK Hynix announced that it has introduced the industry's first mass-produced high numerical aperture extreme ultraviolet (EUV) lithography system at its M16 plant in Icheon, South Korea. This system boasts a 40% improvement in optical performance compared to existing EUV equipment (NA 0.33). This improvement enables the production of circuit patterns with 1.7 times greater precision and a 2.9-fold increase in integration density.