Asia Tech Wire (Aug 13) -- Japan's Okinawa Institute of Science and Technology Graduate University (OIST) has developed a technology that dramatically reduces the power consumption and manufacturing costs of extreme ultraviolet (EUV) lithography equipment.

The technology reduces the number of mirrors in the EUV path from the equipment's light source to the lithography from 10 to four.

The overall power consumption, centered on the EUV light source, can be reduced to about one-tenth of the original.

And the structure of the equipment can also be greatly simplified, so the cost of introducing the equipment, which is currently estimated to be around 20 billion yen, can be almost halved.

The university will work with companies to achieve the localization of EUV lithography equipment in Japan.